Deadline for Papers: August 18, 2006
Download the Call for Papers EMLC 2007
The program committee requests contributions on the topics listed below.
Mask Manufacturing
Pattern Generation and Data Preparation
Photomask Processes and Materials
Mask Process Yield
PS-Mask and Masks for OPC
Mask for NGL: E-Beam, EUV, NIL…
Metrology
Defect Inspection and Repair
Cleaning and Pelliclization
Other Mask Topics
Mask Cost and Mask CoO
Future Mask Demand
Mask Business Considerations
Lithography and Mask Applications
Resolution Enhancement Techniques
MEEF
Resist
Mask Defect Printability
Optical Materials
Immersion Lithography
Immersion Defectivity
Alternate Immersion Fluids
Emerging Lithography Technologies: 157nm, EUV; X-Ray and Nanoimprint and embossing
Double exposure lithography strategies
Maskless lithography techniques
Mask and Lithography Equipment